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1.Ti B N films were synthesized by alternative deposition of Ti and h BN through substrate rotation in multi target magnetron sputtering system The microstructure and mechanical properties of films were studied by XRD, TEM and microindentor It is shown that deposited Ti B N films exists as amorphous Ti(N,B) compound and the hardness reaches HK2470 After crystallization, Ti B N films consist of Ti(N, B)crystal existed in TiN like structure and the hardness decreases a little
采用双靶轮流溅射技术,以Ti和六方氮化硼(h-BN)反应合成Ti-B-N薄膜,并采用XRD、TEM和显微硬度计研究薄膜的微结构及其力学性能。 结果表明,镀态Ti-B-N薄膜为非晶体Ti(N,B)化合物,其硬度达到HK2470;收藏指正
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