buffer beam
1.By using the molecular beam epitaxy (MBE) and plasma assisted MBE with oxygen atmosphere, the ZnO thin films were deposited on Si(100),GaAs(100) and Al 2O 3 (0001) substrates with Zn,ZnS,or Zn O buffers respectively,under different temperatures of beam source and of substrate. The buffer layer is necessary for preparation of ZnO thin film, in order to minimize the effect of mismatch of crystal lattice between substrates and ZnO.
