drift region
2.A PROPOSAL OF DOUBLE HETEROJUNCTION DOUBLE DRIFT-REGION InP/InGaAsP/InP AVALANCHE DIODE
6.A novel SOI LDMOS structure with step thickness drift region is proposed, in this structure the drift region is divided into different parts with thickness increasing from source to drain, electric field distribution is improved due to modulation effect of step drift region, and therefore the breakdown voltage is increased.

