3.Microstructure and Optical Properties of Hydrogenated Amorphous Silicon Nitride Films Deposited by HeliconWave Plasma Enhanced Chemical Vapor Deposition
4.Silicon nitride films(SiN) are deposited by heliconwave plasma enhanced chemical vapour deposition(HWP CVD) under the condition that a gas mixture of SiH 4 and N 2 is required. The influence of experimental parameters on the properties of the sample films is investigated.
