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1.Surface discharge in power cable accessories is correlation with interface pressure and interface state.
试验研究了电缆附件与电缆主绝缘结合界面的沿面放电 ,认为放电电压与界面压强和界面状态密切相关。收藏指正
2.A Study of Radiation Induced Interface State in MOS Capacitors by Gray-Brown Method
应用Gray—Brown法研究MOS电容辐射感生界面态密度收藏指正
3.The Gray-Brown method has been performed to measure Si/SiO_2 interface state density D(?) near conduct and valence band, also the average interface state density Dit.
本工作建立了能准确测量MOS电容禁带两端界面态密度分布和平均界面态密度的Gray-Brown法(简称G-B法),并同高低频C-V法进行了比较,结合Stretch Out(简称S-O)法研究了不同工艺MOS电容的辐照感生界面态特性。收藏指正
4.Discussion shows that the barrier height of Sn/Au HgCdTe contact is pinned at "Bardeen limit" and the interface state density is one magnitude higher than that of the dielectric film HgCdTe interface.
结果表明 ,Sn/Au金属膜 -碲镉汞薄膜 PN器件的电极界面的势垒高度锁定在“Bardeen”限 ,界面密度比介质膜 -碲镉汞的大一个量级收藏指正
5.The analytical model which comprises the temperature compensation for the SiC MOSFET is modified by considering the Gauss model of interface state density and the Poole-Frenkel effect.
考虑界面态电荷高斯分布模型以及Poole-Frenkel效应,对SiC MOSFET补偿电流源模型进行了修正,分析了造成6H-SiC NMOS与PMOS器件补偿电流源变化的原因.收藏指正
6.It shows that the bias in the post-irradiation recovery period and the ratio of the interface state to the electron tunneling influence the recovery rate.
模拟结果表明:退火过程所加栅偏压的大小以及隧道电子效应与建立的界面态所占比例的不同影响器件的恢复率。收藏指正
7.The experimental results indicated that under 77°K radiation,the induced oxide charge in n-chan-nel MOSFETs was more evident than at room temperature and the increase of radiation induced interface state at 77°K was about 20% of that at room temperature.
在77°K辐照下,n沟道MOSFET辐照感生氧化层电荷比室温更加明显。 77°K时,辐照感生界面态的增加是室温辐照下的20%左右。收藏指正
8.The results show that treating the surface of plant fiber with styrene acrylic acid latex can improve effectively the fiber matrix interface binding state of plant fiber gypsum composites, and a remarkable increase in its mechanical properties can be obtained.
并采用苯丙乳液对植物纤维进行表面处理,有效地改善了植物纤维石膏复合材料的界面结合状况,使其力学性能得到显著提高收藏指正
9.Use the Restore button that is associated with each DS1 to move the DS1 interface from the OOS state to the ACTIVE state.
使用与每个 DS1 相关的 Restore 按钮使 DS1 接口从 OOS 状态变为 ACTIVE 状态。收藏指正
10.The best process is that Zr is oxidized in a NaCO3 melt for half and an hour. SEM、EPMA、XAFS、XPS、HRTEM were adapted to investigate the topography, chemical composition, interface structure, oxidation state of Zr of Zr/ZrO2 electrode.
应用SEM、EPMA、XAFS、XPS、HRTEM等方法,对Zr/ZrO2电极膜材料的形貌、成分、界面结构、物相类型和薄膜元素的价态等进行了表征,发现并研究了电极膜材料Zr/ZrO2界面的形貌和成分分带的现象。收藏指正
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