microwave semiconductor
1.The Plasma Batch System 300 is a compact Microwave Plasma Batch System for resist ashing and wafer cleaning in semiconductor applications.
2.In recent years, as one kind of new function material, CVD diamond thick film has been used in many field such as cutting tool, cooling device of super-high speed computer CMOS chip, cooling device of semiconductor and microwave parts, and shown unique superiorities.
3.Metal-semiconductor field effect transistors(MESFETs) with the substrate of nonintentionally doped(ND) semi-insulating (SI) GaAs have been widely used in very large scale integration (VLSI) and monolithic microwave integrated circuit (MMIC). Hence, the study of mechanism for NDLECSI GaAs substrate material to affect the performance of MESFET is very necessary to the design of integrated circuit and fabrication of the devices.
4.The properties, such as output pulse width and spectrum of actively mode-loc-"king semiconductor laser with an external grating cavity are studied in detail. The Optimization process of the parameters of the device influencing the pulse width is given. With sinusoidal microwave modulation, a fully mode-locked pulse train is obtained with the FWHM as short as 8.2ps, repeated frequency 961.06MHz, peak power greater than 150mW and tuning range greater than 10nm.
