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1.Hard nanocomposite Ti-Si-N films were deposited on 321 stainless steel substrate by direct current(DC) reactive magnetron sputtering using a Ti-Si mosaic target consisting of a Ti plate and Si chips. The composition,microstructure and mechanical properties were investigated using EDX,XRD,XPS,AFM,nano-indentation and scratch test.
采用Ti-Si复合靶在321不锈钢基体上用直流磁控反应溅射方法制得超硬纳米复合Ti-Si-N膜层,并借助能谱仪(EDX)、X射线衍射(XRD)、X光电子谱(XPS)、原子力显微镜(AFM)、纳米压入仪和划痕仪对膜层的成分、结构和力学性能进行了分析.收藏指正
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