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1.substrate, avery thin and high-doped layer with a peak carrier concentration of 0.5-1×10~(13)cm~(-2)and a thickness less than 0.1μm is formed for FET channel as well as for source/drainlayer,between Al gate and GaAs active layer,there is an anodized native oxide layerwith a thickness less than 10~2 A.
GaAs衬底上用离子注入Si,同时形成高浓度、超薄的有源层和欧姆接触区,载流子峰值浓度为 0.5-1×10~(13)cm~(-3). 在Al栅和GaAs有源层间有一层用阳极氧化制备的自身氧化膜,厚度10~2A|°.收藏指正
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