semiconductor doping
1.Phosphine(PH3)is an important electronic specific gas which is mainly used in fields of N-type semiconductor doping,ion implement and chemical vapor deposition(CVD) etc.
4.Controlled concentrations of specific donors or acceptors may be intentionally added into materials to form extrinsic semiconductor using various techniques. Such an alloying process in semiconducting materials is termed doping.
5.In the process of doping Zn into InP induced by the pulsed laser,the temperature of the semiconductor and metal interface is one of the most important factors which affect the depth and impurity concentration of laser inducing doping.
6.Transient Current in Doping-Modulated Amorphous Semiconductor Super-Lattices (I)——Motion of Carriers under Static Electric Field
7.The doping behavior (adsorption behavior) of lithium cation (Li++) on the surface of polyacene semiconductor was investigated by using quantum chemistry MNDO, CNDO/2 methods. The stable adsorption site of Li++ over benzene ring was found.
