semiconductor film
2.In the paper, the newest methods for syntyesing diamend film, Cubic BN film,superconductor film and semiconductor film at home and abroad are introduced.
3.The regression analysis of 1n(iph), (U-Ufb )1/2 for an amorphous semiconductor film on iron surface indicated that NaNO2 affected the anodic behavior of armco-iron by changing the ionization energy of the localization state of amorphous semiconductor film.
7.The following text is about the newly-developed crystall membrane iodine ion sensitive semiconductor device in which Si3N4 /SiO2 is used as the insulator film and AgI-Ag2S as sensitive film and includes an analysis of its mechanism of the sensitivity.
8.Mott-Shottky plot analysis further demonstrated that the oxide film was a n-type semiconductor and the higher donor density under high potential further indicated the existence of Cl~- in the film.
9.The Seebeck coefficient measurement analysis indicated that Bi2-xTe3+x film have N-type semiconductor characteristic.
10.The XPS analysis indicates that the stoichiometric excess of CSN in both solutions shows that the CuSCN thin film deposited on ITO glass is ptype semiconductor.
