"W. H. O."相关例句(15)
2.A side extraction PIG ion source with permanent magnet for extracting negative ions,such as H-,O-,F-,etc. is introduced. At 15kV extraction voltage,O-beam of 130 μ A and F- beam of 75 μ A are obtained,and the discharge power consumption is 110 and 280W respectively.
6.Methanol was selected as a model reactant to carry out laser stimulated surface reaction(LSSR), where heteropoly compounds H 3PMo 12 O 40 · x H 2O? H 3PW 12 O 40 · x H 2O and H 6PMo 6W 6O 40 · x H 2O were used as solid surface materials and a TEA CO 2 laser generator was used as light source. Basing on IR and TPD tests, the vibration modes were discussed.
7.Photodegradation of dichlorvos(DDVP)was investigated by irradiating with a 9W mercury lamp and using H 2O 2、K 2S 2O 8 as oxidents.
9.By fitting different objective functions with nonlinear Marquart computer program to the data obtained under the experimental conditions, the optimal reaction rate expression for COS hydrolysis was gained as follows r(COS)=-dXd(W/f(COS))=1.82·10 14 p(COS) p -0.5(H 2O)exp- 75? 8008.374T. The model was tested by mathematical statistic method and residual distribution.
11.Diam ond film w as used as buried insulator in silicon on diam ond ( S O D) technology. 54 H C T03 C M O S/ S O D integrated circuit w as fabricated by using S O D w afer. The recovery character istics of the S O D circuit under radiation w ere studied, and the results show that the recovery ability ofthe S O D circuit is clearly higher than that of bulk silicon circuit.
12.Results show that three kinds of precursors with different initial solution composition are obtained during the deposition process under ultrasonic irradiation at 200W for 60min. After heat treated at 900℃ for 2h,Y2SiO5,Y4.67(SiO4)3O and Y2Si2O7 with the particle sizes of 40-55nm、50-65nm and 25-40nm can be achieved.
