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1.In this paper,we report the result of diamond like carbon films grown at comparatively low substrate temperature(120 ℃) on Si, Mo and glass substrates by direct photo chemical vapor deposition (CVD) technique. In the process,a microwave excited vacuum ultraviolet(VUV) Xe lamp is used as the light source and the mixture of C 2H 2 and Ar is used as reactive gases.
以微波激励氙(Xe) 发射的真空紫外光(VUV) 作光源,乙炔(C2H2) 作反应气体,采用直接光化学汽相淀积(CVD) 工艺,在硅(Si) 、钼( Mo) 及玻璃衬底上,120 ℃的低温下进行了类金刚石碳(DLC) 膜的试生长。收藏指正
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